PSM Plasma Technology of NPT V31 Vacuum Plasma Cleaner for PCB Desmear & Teflon Activition
PSM Plasma Systems is global leader plasma technology for
Semiconductor, PCB, LCD and Material industries.
We PSM Inc. has rich experience and excellent staffs who
have developed and commercialized various highly evaluated optimized processing
techniques and practical manufacturing systems which are related to
Semiconductor & Display industry, PCB & FCCL industry and other polymer
industries over 10 years in the Institute for Advanced Engineering.
This is indeed useful technique that is able to improve
productivity and quality simultaneously not only for
semiconductor/displays/electronic parts, but for low-temperature material
industry such as polymer & plastic / FPCB & FCCL by a possible in-line
process.
PCB Applications:
AP (Atmospheric Pressure) Plasma System
AP (Atmospheric Pressure) Plasma System Can treat substrate
automatic in-line process.
PSM NPT series AP plasma system is applicable for whole
back-end line of PCB/ SMT. This NPT series provides good uniformity and process
consistency. Atmospheric Pressure Plasma
Cleaning System
PCB (NPT306):
Fine Pitch is the latest trend in PCB Substrate.
Fine Pitch (Smaller Circuit Width, Circuit Gap and Ball Pad
Size) have caused increased failure such as Pit Failure, Wetting Failure,
Organic Residual Remove and Surface Cleaning.
These issues have led to increased requirement for plasma
processing. More>>
SMT & PCB(NPT304-300s):
Pre-treatment of screen print, ball placement.
PCB & Wafer flip chip bumping.
(Decrease defect of small & large& missing problems)
More>>
Vacuum Plasma System:
PCB Desmear (NPT-V31)
The NPT-V31 plasma system is widely used for the surface
cleaning and modification process of PCB Desmear and material treating.
PSM NPT-V31 plasma system has been applied the treatment of
PCB& FPCB Desmer and Etch back. More>>
NPT V31:
Vacuum Plasma Cleaner For PCB Desmear & Teflon
Activition:
Major Applications:
·
PCB&FPCB Desmear
·
Teflon Surface Activation (Pretreatment for Cu
Plating)
·
Cleans Carbon Residues after Laser Machining
·
Clean Wre Mesh for Line Pattern Process.
Specifications:
·
Plasma Source: MF (Medium Frequency) Power
·
Sample Size: 460(W)×610(D)
·
Process Efficiency: 1200-2400 sec/batch
·
PLC Control with Color Touch Screen
·
Sliding Door Type
·
Process Gas: CF4, N2, O2 (with MFC control)
·
Power Source: AC 220V, 50/60 Hz, 3 Phase
System Features:
·
Plasma Efficiency Improvement & Short
Process Time by Optimized Design of Electrode
·
Environmental Friendly Process and Safe Working
Condition

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